大家都搜：
射线遮罩
1、ultraviolet ray───紫外线；紫外（射）线
2、mask───vt.掩饰；戴面具；使模糊；n.面具；口罩；掩饰；[计]掩膜；vi.掩饰；戴面具；化装
3、Ray Lynch───雷·林奇
4、ray───vi.放射光线；浮现；n. (Ray)雷（人名）；n.射线；光线；鳐鱼；vt.放射；显出
5、the ray───射线
6、cousin ray ray───雷·雷表弟
7、ray beat───射线拍
8、sickening ray───令人作呕的射线
9、Ray ma───雷马
1、In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.───在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
2、2 Schematic diagram of X-ray mask fabrication procedure───支撑并除去基片图2深度光刻X射线掩模研制工艺流程
3、the above X-ray mask workbench, quartz ring workbench, ultraviolet source , parallel lens and microscopes.───所说的X射线掩模工作台、石英环工作台、紫外光源、平行透镜和显微镜均安装在一框架上。
4、This article mainly explains the process of LIGA technology, which includes X-ray mask lithography, Micro-electroforming and Micro-copy.───本文主要阐述了LIGA技术的工艺过程，包括X射线深层光刻、微电铸和微复制工艺。
5、Nucleation of Nano-Diamond Films for X-Ray Mask Substrates───用于X射线光刻掩模的纳米金刚石膜成核研究
6、Study Progress of the Diamond Film Used as X-ray Mask───金刚石膜同步辐射X-射线掩模的研究进展
7、fabrication procedure of the mask and results of the deep X ray lithography are given.───给出了该掩模设计制作工艺过程及深x射线光刻结果。