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电子束光刻
电子束平印术
1、beam───n.横梁；光线；电波；船宽；[计量]秤杆；vt.发送；以梁支撑；用…照射；流露；n.(Beam)人名；(ALa伯)贝亚姆；(英)比姆；vi.照射；堆满笑容
2、lithography cof───平版印刷
3、lithography───n.[印刷]平版印刷术，石印术
4、electron shell───[物]电子壳层；[物]电子壳；[物]电子层
5、lithography cis───光刻cis
6、electron───n.电子
7、lithography solutions───光刻解决方案
8、electron beam───[物]电子束
9、outermost electron───最外层电子
1、This paper introduced the develop level of electron beam lithography in the world and the techniques used in pattern generators.───论文首先简要介绍了国内外电子束曝光技术的发展水平和图形发生器的工作原理。
2、There are two major topics in my research. One is the research of electron-beam lithography proximity effect correction.───在本篇论文有两个主题，一个是电子术微影邻近效应的修正，另一个抗反射层的制备。
3、Mask fabrication is a key technique of scattering with angular limitation projection electron-beam lithography (SCALPEL).───掩模制作是电子束散射角限制投影光刻(SCALPEL)的关键技术。
4、Electron beam lithography technique has developed in recent thirty years. It has been used in many fields such as micro fabrication.───电子束曝光技术是近三十年来发展起来的一门新兴技术，目前广泛应用于微细加工等各种领域。
5、Inductors were defined by electron-beam lithography and formed by depositing micron-thick aluminium metal onto the wafers.───用电子束刻蚀法在晶片上镀上纳米级铝层形成了电感器。
6、A conic primitive based intermediate pattern and its data format of electron beam lithography are defined.───在一种新的电子束曝光机二次曲线单元图的基础上定义了一种中间图形数据格式。
7、They then defined the transistor channel using electron-beam lithography, removing graphene outside of channel regions with an oxygen plasma.───然后在氧等离子体中用电子束刻蚀法去除沟道区石墨烯形成晶体管的沟道。
8、Approaching higher resolution is the critical issue for electron-beam lithography.───追求更高的分辨率是电子束曝光研究的核心内容。